Method and system for computing fourier series coefficients for mask layouts using FFT
US8402399B2 · kind B2 · utility
2Cited by
5References
13Claims
0Family size
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Key dates
| Filing date | Apr 8, 2011 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Jul 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.