Electron beam vapor deposition apparatus and method
US8404047B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 16, 2008 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Dec 20, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.