Manufacturing method of planar optical waveguide device with grating structure
US8404133B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2009 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Jul 3, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/124
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a planar optical waveguide device of which a core includes a plurality of alternatively arranged fin portions and valley portions to form a grating structure, in which the core widths of the valley portions vary along the longitudinal direction, the method including: a high refractive index material layer forming step of forming a high refractive index material layer; a photoresist layer forming step of forming a photoresist layer on the high refractive index material layer; a first exposure step of forming shaded portions on the photoresist layer using a phase-shifting photomask; a second exposure step of forming shaded portions on the photoresist layer using a binary photomask; a development step of developing the photoresist layer; and an etching step of etching the high refractive index material layer using the photoresist pattern resulted from the development step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.