Method of aligning photomask with base material and method of manufacturing printed circuit board
US8404410B2 · kind B2 · utility
0Cited by
1References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 12, 2011 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Oct 4, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/166
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An exposure system includes an exposure device and an image processing device. The exposure device includes a plurality of cameras. Each of the cameras is configured so as to be selectively set to a full scan mode and a partial scan mode. The camera transmits all of obtained image data in the full scan mode, and extracts part of the obtained image data and transmits the partial image data in the partial scan mode. The image processing device paratactically performs processing using the image data transmitted from the camera and processing using the image data transmitted from the camera.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.