Method for manufacturing thin-film magnetic head
US8404431B1 · kind B1 · utility
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Key dates
| Filing date | Nov 4, 2011 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Nov 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49048
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a thin-film magnetic head includes processes of forming a polishing position sensor and a recording head portion alongside on one side of a wafer. The process of forming the recording head portion has a step of performing a photolithography process after applying an alkali soluble resin film and a photoresist film in the named order. The process of forming the polishing position sensor has a step of performing a photolithography process on the photoresist film while having only the photoresist film out of the alkali soluble resin film and the photoresist film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.