Photolytic acid-generating polymers and monomers for their construction
US8404795B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Aug 26, 2010 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Aug 26, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G75/30
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise a photoacid generator (PAG) component and at least a second component that is photolytically stable and acid-stable. The polymers may also contain a third, acid-labile component. The photoacid generator is based on N-sulfoxyimides and related moieties that contain photolabile oxygen-heteroatom and oxygen-aromatic carbon bonds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.