Method and apparatus for sensing applied forces
US8408077B2 · kind B2 · utility
1Cited by
7References
72Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 22, 2003 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Jul 6, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/30469
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for sensing a force. The apparatus includes a nanostructure being suitable for emitting electrons and a collector. The collector is proximately positioned with respect to the nanostructure so as to receive the emitted electrons and define a gap therebetween. The gap is partially dependent upon the applied force and the emission and reception of the electrons are indicative of the applied force.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.