Length measurement system based on optical recognition pattern for length measurement
US8408476B2 · kind B2 · utility
2Cited by
9References
11Claims
0Family size
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Key dates
| Filing date | Jan 25, 2011 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Feb 21, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06K19/06037
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An optical recognition pattern for length measurement is mounted on an optical contact surface and includes a plurality of optical recognition units, each of which corresponds to a length value. The sequence of the optical recognition units on the optical contact surface is consistent with that of the corresponding length values in such a way that the optical recognition pattern imitating the conventional measuring ruler can be constituted. Besides, the optical recognition pattern can further work with an optical recognition device to constitute a length measurement system that the optical recognition is applied to.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.