Patent · US Active

Production of bulk silicon carbide with hot-filament chemical vapor deposition

US8409351B2 · kind B2 · utility

14Cited by
13References
38Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 5, 2008
Grant dateApr 2, 2013
Priority date
Expiry dateMar 27, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/36
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method to grow a boule of silicon carbide is described. The method may include flowing a silicon-containing precursor and a carbon-containing precursor proximate to a heated filament array and forming the silicon carbide boule on a substrate from reactions of the heated silicon-containing and carbon-containing precursors. Also, an apparatus for growing a silicon carbide boule is described. The apparatus may include a deposition chamber to deposit silicon carbide on a substrate, and a precursor transport system for introducing silicon-containing and carbon-containing precursors into the deposition chamber. The apparatus may also include at least one filament or filament segment capable of being heated to a temperature that can activate the precursors, and a substrate pedestal to hold a deposition substrate upon which the silicon carbide boule is grown. The pedestal may be operable to change the distance between the substrate and the filament as the silicon carbide boule is grown.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.