Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same
US8409788B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2010 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Oct 7, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A laser induced thermal imaging (LITI) method, a method of patterning an organic layer using the same and a method of manufacturing an organic light emitting diode (OLED) display device using the same. The LITI method includes preparing a substrate including a transfer layer, preparing a donor substrate including a base film and a light-to-heat conversion layer disposed on the base film, aligning the substrate with the donor substrate, and irradiating laser to the base layer of the donor substrate. Here, the laser is irradiated to the base layer in a region excluding a region corresponding to a pattern to be formed on the substrate. Thus, according to the method, regardless of the size of the pattern to be formed and the size of the laser beam, stitching mura can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.