Non-vacuum method for fabrication of a photovoltaic absorber layer
US8409906B2 · kind B2 · utility
4Cited by
13References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2010 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | May 22, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/541
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a non-vacuum method of depositing a photovoltaic absorber layer based on electrophoretic deposition of a mixture of nanoparticles with a controlled atomic ratio between the elements. The nanoparticles are first dispersed in a liquid medium to form a colloidal suspension and then electrophoretically deposited onto a substrate to form a thin film photovoltaic absorber layer. The absorber layer may be subjected to optional post-deposition treatments for photovoltaic absorption.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.