Etching composition for etching a transparent electrode
US8409999B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Nov 16, 2010 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | Dec 19, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.