Patent · US Active

Silicon carbide, sapphire, germanium, silicon and pattern wafer polishing templates holder

US8414361B2 · kind B2 · utility

4Cited by

11References

16Claims

0Family size

Inventors

Phuong Nguyen · San Diego, US
Thang Tran · San Jose, US

Key dates

Filing date	Aug 13, 2010
Grant date	Apr 9, 2013
Priority date	—
Expiry date	Oct 13, 2031

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B57/02
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A template for polishing Silicon Carbide, Sapphire, Germanium, Silicon and pattern wafers having a slurry inlet, channels, outlets and pockets for holding said wafers terminating in peripheral vacuum ports in order to facilitate an efficient flow of slurry over the semiconductor wafers during a polishing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.