Manufacturing method of thin film transistor array substrate and liquid crystal display panel
US8415182B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2009 |
| Grant date | Apr 9, 2013 |
| Priority date | — |
| Expiry date | Mar 4, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G2360/144
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A manufacturing method of a thin film transistor array substrate is provided. In the method, a substrate having a display region and a sensing region is provided. At least a display thin film transistor is formed in the display region, a first sensing electrode is formed in the sensing region, and an inter-layer dielectric layer is disposed on the substrate, covers the display thin film transistor, and exposes the first sensing electrode. A patterned photo sensitive dielectric layer is then formed on the first sensing electrode. A patterned transparent conductive layer is subsequently formed on the substrate, wherein the patterned transparent conductive layer includes a pixel electrode coupled to the corresponding display thin film transistor and includes a second sensing electrode located on the patterned photo sensitive dielectric layer. A manufacturing method of a liquid crystal display panel adopting the aforementioned thin film transistor array substrate is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.