Patent · US Active

Aromatic ring-containing polymer for underlayer of resist and resist underlayer composition including the same

US8415424B2 · kind B2 · utility

1Cited by
4References
12Claims
0Family size

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Key dates

Filing dateJul 2, 2012
Grant dateApr 9, 2013
Priority date—
Expiry dateJul 2, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F232/08
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.