Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
US8420043B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 14, 2006 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Nov 20, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/25
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A nano-crystal diamond film synthesized on a substrate and containing, as a major component, nano-crystal diamond having a grain diameter from 1 nm to less than 1000 nm. This nano-crystal diamond film can be formed on a substrate by means of a plasma CVD method using a raw material gas containing a hydrocarbon and hydrogen, allowing the formation of the nano-crystal diamond film to take place outside the plasma region. This nano-crystal diamond film is applicable to the manufacture of an electrochemical device, an electrochemical electrode, a DNA chip, an organic electroluminescent device, an organic photoelectric receiving device, an organic thin film transistor, a cold electron-emission device, a fuel cell and a catalyst.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.