Method of forming pattern and manufacturing method of organic light emitting device
US8420156B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2011 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Jun 3, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a pattern and a method of manufacturing an organic light emitting device, the method of forming a pattern including providing an electromagnetic substrate for generating an electromagnetic field at a selectively controllable position by selectively controlling where current flows through the electromagnetic substrate; providing a patterning substrate for forming a pattern; aligning the electromagnetic substrate to a first surface of the patterning substrate; selectively applying current to the electromagnetic substrate to form the electromagnetic field at the predetermined position; providing masking powder in a vicinity of a second surface of the patterning substrate such that the masking powder reacts to the electromagnetic field; supplying a pattern forming material to the second surface of the patterning substrate; and cutting off the current to the electromagnetic substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.