Method and apparatus of growing a thin film
US8420186B2 · kind B2 · utility
1Cited by
2References
5Claims
0Family size
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Key dates
| Filing date | Nov 29, 2007 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Apr 30, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F71/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus of growing a thin film are provided. The method comprises at least (a) providing a number of substrates; (b) cleaning the substrates; and (c) placing the substrates into a reaction liquid; (d) vibrating the reaction liquid by ultrasonic waves such that a thin film is grown on the substrates evenly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.