Photoresist composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same
US8420296B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Aug 26, 2010 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Dec 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0754
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent.In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.