Method and apparatus for generating periodic patterns by step-and-align interference lithography
US8420305B2 · kind B2 · utility
0Cited by
5References
10Claims
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Key dates
| Filing date | May 5, 2010 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Apr 15, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.