Patent · US Active

Method and apparatus for mapping of line-width size distributions on photomasks

US8421026B2 · kind B2 · utility

3Cited by

2References

36Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Guy Ben-Zvi · Tamra, IL
Vladimir Dmitriev · Moran, IL
Eitan Zait · Afula, IL
Erez Graitzer · Kiryat Shmona, IL

Key dates

Filing date	Jan 2, 2009
Grant date	Apr 16, 2013
Priority date	—
Expiry date	Feb 25, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70625
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In general, in one aspect, a method includes determining a critical dimension (CD) distribution on a photomask by measuring deep Ultra-Violet (DUV) transmission across the photomask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.