Patent · US Active

Antimonide-based compound semiconductor with titanium tungsten stack

US8421121B2 · kind B2 · utility

3Cited by
28References
14Claims
0Family size

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Key dates

Filing dateApr 18, 2007
Grant dateApr 16, 2013
Priority date
Expiry dateJan 22, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/4732

Abstract

An apparatus in one example comprises an antimonide-based compound semiconductor (ABCS) stack, an upper barrier layer formed on the ABCS stack, and a gate stack formed on the upper barrier layer. The upper barrier layer comprises indium, aluminum, and arsenic. The gate stack comprises a base layer of titanium and tungsten formed on the upper barrier layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.