Antimonide-based compound semiconductor with titanium tungsten stack
US8421121B2 · kind B2 · utility
3Cited by
28References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2007 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Jan 22, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/4732
Abstract
An apparatus in one example comprises an antimonide-based compound semiconductor (ABCS) stack, an upper barrier layer formed on the ABCS stack, and a gate stack formed on the upper barrier layer. The upper barrier layer comprises indium, aluminum, and arsenic. The gate stack comprises a base layer of titanium and tungsten formed on the upper barrier layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.