System and method for causing cavitation in a liquid metal
US8421306B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Jul 7, 2010 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Aug 20, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F3/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Systems and methods for achieving cavitation at high static pressures which may be used in acoustic applications and research such as in liquid metal resonators. Novel preparation and electroplating methods are disclosed to improve boundary layer conditions. A chemical cleaning loop for containment and treatment for oxide removal and to develop a dynamic system for chemically treating liquid metal disposed in a liquid metal loop is also described. A liquid metal handling loop for containment and treatment is provided to maintain cleanliness of bulk liquid metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.