Projection exposure apparatus and projection exposure method
US8421999B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2008 |
| Grant date | Apr 16, 2013 |
| Priority date | — |
| Expiry date | Dec 24, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.