Process and device for cleaning and etching a substrate with a transparent conductive oxide layer

US8425793B2 · kind B2 · utility

Assignee

• Forschungszentrum Jülich GmbH · DE

Inventors

• Joachim Müller · Bad Kötzting, DE
• Gunnar Schöpe · Linnich, DE
• Hildegard Siekmann · Kerkrade, NL
• Bernd Rech · Bokensdorf, DE
• Tobias Repmann · Alzenau, DE
• Wolfgang Apenzeller · Titz, DE
• Brigitte Sehrbrock · Lich, DE

Key dates

• Filing date: Mar 31, 2005
• Grant date: Apr 23, 2013
• Expiry date: Oct 9, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6708
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A simple process is disclosed for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed through a device. The process is technically simple to implement and makes it possible to regularly and homogeneously roughen and texturize ZnO layers of up to 1 m2. The device for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports has for that purpose a first means for treating the substrate with an etching liquid, a second means for treating the substrate with a cleaning liquid, and another means, in particular transport rollers, for conveying the substrate from the first to the second means.