Patent · US Active

Process and method for modifying polymer film surface interaction

US8426025B2 · kind B2 · utility

0Cited by

11References

7Claims

0Family size

Assignee

OBDUCAT AB · SE

Inventors

Matthias Keil · Malmö, SE
Jakob Nilsson · Säter, SE
Johan Ring · Malmö, SE
Babak Heidari · Furulund, SE

Key dates

Filing date	Dec 10, 2009
Grant date	Apr 23, 2013
Priority date	—
Expiry date	Oct 12, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/3154
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.