Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use
US8426082B2 · kind B2 · utility
2Cited by
1References
11Claims
0Family size
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Key dates
| Filing date | Oct 15, 2010 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Oct 15, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0198
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Magnetic nanoparticle masks for lithographic applications of a substrate and methods for producing such masks via defining regions of localized magnetic field maxima and minima on a substrate are provided. Also provided are methods for producing multi-component patterns on a substrate with the magnetic nanoparticle masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.