Method of fabricating liquid crystal display device
US8426229B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2010 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Apr 5, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of fabricating a LCD device that includes forming sacrifice layer patterns in a pixel region while forming a gate line, a first storage electrode, and a gate pad on a substrate; sequentially forming a gate insulation film, an amorphous silicon film, an impurity-doped amorphous silicon film, and a source/drain metal film on a substrate, forming a transparent conductive material on the substrate covered with a protection and then patterning the transparent conductive material to form a second storage electrode overlapping the first storage electrode and an electrode pattern having a part overlapping an area of one side edge of the sacrifice layer patterns and the other part formed on the substrate; and simultaneously forming a common electrode and a pixel electrode in the pixel region by performing a lift-off process to remove the sacrifice layer patterns on the substrate where the electrode pattern is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.