Patent · US Active

Method for producing metal substrates for HTS coating arrangements

US8426344B2 · kind B2 · utility

1Cited by
0References
20Claims
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Key dates

Filing dateNov 24, 2009
Grant dateApr 23, 2013
Priority date
Expiry dateNov 24, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24355

Abstract

A method is proposed for producing a biaxially textured metal substrate having a metal surface, wherein the substrate is modified in order to produce a high-temperature superconductor coating arrangement and wherein the metal surface is modified in order to deposit a buffer layer or another intermediate layer epitaxially thereon and/or to deposit an oriented high-temperature superconductor (HTS) layer thereon. The method includes producing a biaxially textured metal substrate, subjecting the metal substrate surface to a polishing treatment, in particular an electropolishing treatment, and subjecting the metal substrate to a post-annealing after the surface polishing treatment and before a subsequent coating is performed involving epitaxial deposition of a layer of the HTS coating arrangement. This method results in smooth metal substrates with high textural overcoats and thereby improved HTS layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.