Dispersions of submicron doped silicon particles
US8435477B2 · kind B2 · utility
10Cited by
67References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 22, 2011 |
| Grant date | May 7, 2013 |
| Priority date | — |
| Expiry date | Sep 22, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2982
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
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