Patent · US Active

Formation of solid layers on substrates

US8435603B2 · kind B2 · utility

5Cited by
16References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 3, 2004
Grant dateMay 7, 2013
Priority date
Expiry dateAug 10, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31699
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a method of forming on the surface of a substrate a first solid layer which is suitable for activating a chemical reaction to form a second layer thereon, the method comprising the steps of: applying to the surface of the substrate a first liquid comprising a curable composition and an activator for the second layer-forming chemical reaction; and curing the curable composition, thereby forming a first solid layer adhered to the surface of the substrate, capable of activating the second layer-forming chemical reaction. A second layer can then be formed on the substrate by bringing into contact with the first solid layer a second fluid comprising components of a second layer-forming chemical reaction, activated by the activator, thereby causing a second layer to be formed on the first solid layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.