Spatial light modulator (SLM)-based optical attenuator
US8437642B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2008 |
| Grant date | May 7, 2013 |
| Priority date | — |
| Expiry date | May 6, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/147
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus are provided for attenuating an optical beam. The method includes selecting a level of attenuation to be applied to the optical beam. A pattern of on-state and off-state pixels in a two dimensional spatial light modulator (SLM) is selected such that the pattern will modulate the optical beam to provide the selected level of attenuation. Finally, the optical beam is directed onto the SLM while tile pixels are arranged in the selected pattern. The pattern is periodic along a first axis and symmetric along a second axis along which an intensity distribution of die optical beam extends.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.