Apparatus and method for the production of flexible semiconductor devices
US8440020B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2003 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Jan 30, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3277
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for continuously producing flexible semiconductor devices through deposition of a plurality of semiconductor layers onto a moving flexible substrate by using Plasma Enhanced Chemical Vapor Deposition (PECVD) processing, where at least two successive layers are deposited in the same deposition chamber onto the substrate traveling in opposite directions. Computer program product directly loadable into the internal memory of a digital computer comprising software code portions for determining and controlling all the necessary parameters for the production of flexible semi-conductor devices in a such apparatus when said computer program product is run on a computer. Roll-to-roll method for producing flexible semiconductor devices, wherein a plurality of semiconductor layers are deposited in the same deposition chamber onto a flexible substrate moving in opposite directions. Flexible semiconductor device produced with said method, where the penetration rate of one semiconductor layer into its neighboring layer is remarkably low.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.