Flow modulating substrates for early light-off
US8440155B2 · kind B2 · utility
2Cited by
8References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2011 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Sep 7, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An exhaust gas after-treatment system includes at least first and second substrates. The first substrate has a first region and a second region circumferentially surrounding the first region. The first region of the first substrate has a higher average cell density than the average cell density of the second substrate. The system can also include at least a third substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.