Fabrication process of a biosensor on a semiconductor substrate
US8440470B2 · kind B2 · utility
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13References
26Claims
0Family size
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Key dates
| Filing date | Dec 16, 2010 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Jan 28, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The disclosure relates to a fabrication process of a biosensor on a semiconductor wafer, comprising steps of: making a central photosensitive zone comprising at least one pixel-type biological analysis device comprising a photosensitive layer, and a first peripheral zone surrounding the central photosensitive zone, comprising electronic circuits. The first peripheral zone is covered by a hydrophilic coating, and the central photosensitive zone is covered with a hydrophobic coating. A barrier of a bio-compatible resin is formed on the second peripheral zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.