TFT-LCD array substrate and manufacturing method thereof
US8441592B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2010 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | May 14, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136286
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate comprises: forming a gate line and a gate electrode on a base substrate, and then depositing a gate insulating layer on the base substrate; forming an active layer, a data line, a source electrode, and a drain electrode on the gate insulating layer, and removing the gate insulating layer in the region other than the regions of the active layer, the data line, the source electrode and the drain electrode; forming a first via hole, a second via hole and a third via hole in a photoresist layer by an exposing and developing process; and forming a pixel electrode, a first connection electrode and a second connection electrode on the photosensitive resin layer. The pixel electrode is connected with the drain electrode through the third via hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.