Composition for radical polymerization and method of forming pattern using the composition
US8445178B2 · kind B2 · utility
2Cited by
19References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 5, 2009 |
| Grant date | May 21, 2013 |
| Priority date | — |
| Expiry date | Aug 6, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2053
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.