Hardmask composition having antireflective properties and method of patterning material on substrate using the same
US8445187B2 · kind B2 · utility
14Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2011 |
| Grant date | May 21, 2013 |
| Priority date | — |
| Expiry date | Jul 14, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.