Photosensitive compound and its photosensitive polymer
US8450517B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 20, 2011 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Sep 20, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention is to provide a photosensitive compound suitable for a photoalignment method, a photosensitive polymer prepared from the compound, a photoaligning agent by using the compound and a liquid crystal alignment film prepared from the photoaligning agent. A photosensitive compound represented by formula (1):in formula (1), Y1 is a divalent group represented by formula (2-1) or (2-2); A1 is 1,4-phenylene or 1,4-cyclohexylene; Z1 is a single bond, —COO— or —OCO—; R1 and R2 are each independently hydrogen, fluorine or alkyl having 1 to 5 carbons; Q1 is independently a single bond or alkylene having 1 to 12 carbons; and n is 0 or 1. In formulas (2-1) and (2-2), W1 and W2 are each independently hydrogen, alkyl having 1 to 3 carbons or alkoxy having 1 to 3 carbons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.