Electrooptical device substrate and method for manufacturing the same, electrooptical device, and electronic apparatus
US8450739B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 22, 2010 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Jul 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1368
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electrooptical device substrate, contains: a first insulating film provided on a substrate; two or more pixels; a first concave portion provided in the first insulating film over the two or more pixels; a second concave portion provided on the bottom surface of the first concave portion; a thin film transistor containing an organic semiconductor layer provided in the second concave portion, a gate insulating film provided on the organic semiconductor layer, and a gate electrode provided on the gate insulating film and being matched to one pixel among the two or more pixels; a scanning line which is provided at an upper side with respect to the gate insulating film and provided in the first concave portion over the two or more pixels; and a data line electrically connected to the thin film transistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.