Touch panel and method for manufacturing the same
US8451419B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2009 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Feb 4, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13394
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A touch panel and methods for manufacturing the same is provided. The method for manufacturing a touch panel includes providing a substrate and forming a photospacer layer on the substrate. Subsequently, a single lithography process is performed to the photospacer layer to define a main spacer and a sensor spacer. After forming a conductive layer on the main spacers and sensor spacers, a part of the conductive layer is removed to expose a top part and a part of a upper side of the main spacer. Accordingly, the conductive layer on the top part of the main spacer can be completely removed. In addition, the aperture ratio loss due to over-etching the conductive layer on the color filter can be prevented by the conductive layer remained on a lower side of the main spacer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.