Exposure method and exposure apparatus
US8451426B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 7, 2006 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Dec 11, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an exposure apparatus, exposure light from a lamp (continuous light source) (9) is applied at an exposure station (exposure section) (2) to a substrate (4), which is being transferred at a fixed speed in a fixed direction by a substrate transfer section (5), through a mask (11) arranged on an optical axis (optical path) (S) of an exposure optical system (3). At the time of exposing an image of an opening section (11a) of the mask (11) on the substrate (4), the front edge and the side edge (pattern edge) of a pixel (reference pattern) (18) previously formed on the substrate (4) are photographed by a linear CCD (20) of an imaging section (6), and a reference position in the transfer direction and a direction vertical to such direction on the substrate (4) is detected. When the pixel (18) imaged by the imaging section (6) is shifted to an exposure position (E) form an imaging position (F), the exposure station (2) continuously exposes an exposure region along the transfer direction of the substrate (4) while adjusting the position of the mask (11) so that the position of the mask (11) matches with the reference position on the substrate (4).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.