Closed-loop process control for electron beam freeform fabrication and deposition processes

US8452073B2 · kind B2 · utility

Assignee

• The United States of America as represented by the Administrator of the National Aeronautics and Space Administration · US

Inventors

• Karen M. Taminger · Yorktown, US
• Robert A. Hafley · Yorktown, US
• Richard E. Martin · Longmont, US
• William H. Hofmeister · Nashville, US

Key dates

• Filing date: Mar 31, 2010
• Grant date: May 28, 2013
• Expiry date: Oct 2, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/30455
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.