Dual hexagonal shaped plasma source
US8454810B2 · kind B2 · utility
2Cited by
164References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 14, 2006 |
| Grant date | Jun 4, 2013 |
| Priority date | — |
| Expiry date | Feb 16, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3452
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.