Low temperature plasma generator
US8460283B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2009 |
| Grant date | Jun 11, 2013 |
| Priority date | — |
| Expiry date | Oct 5, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2240/20
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generator having a dielectric body; a first end wall and a second end wall attached or coupled to each end of the dielectric body to define a cavity within the dielectric body, and wherein the second end wall includes at least one discharge aperture formed therein; at least one gas inlet formed proximate the first end of the dielectric body; at least one anode located within the cavity of the dielectric body, wherein the at least one anode includes at least one anode aperture; at least one hollow discharge nozzle associated with each discharge aperture, and extending from the second end wall to a nozzle aperture, such that when a generated plasma is produced, the generated plasma flows through each discharge aperture, each associated discharge nozzles, and each associated nozzle aperture; and at least one cathode formed at least substantially around a portion of each discharge nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.