Process for fabricating patterned magnetic recording device
US8460565B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2010 |
| Grant date | Jun 11, 2013 |
| Priority date | — |
| Expiry date | Feb 22, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/7379
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.