Methods and systems for measurement and control of process parameters
US8463423B2 · kind B2 · utility
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9References
35Claims
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Key dates
| Filing date | Jun 25, 2010 |
| Grant date | Jun 11, 2013 |
| Priority date | — |
| Expiry date | Sep 22, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K2207/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for monitoring various process parameters, primarily in connection with processes for the sterilization of particulate foods in a continuous thermal process, make use of application specific integrated circuits (ASIC) that provide process-related data for batch or continuous thermal treatment when the circuit is embedded in a particle subjected to such treatment. The preferred methods are described in connection with process design, and with at least near real-time process control using process data provided by such circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.