Method and apparatus for thermal development having a textured support surface
US8464637B2 · kind B2 · utility
0Cited by
4References
45Claims
0Family size
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Key dates
| Filing date | May 24, 2010 |
| Grant date | Jun 18, 2013 |
| Priority date | — |
| Expiry date | Sep 10, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.