Process of localized electrografting onto photosensitive semiconductor substrates
US8466072B2 · kind B2 · utility
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Key dates
| Filing date | Sep 18, 2008 |
| Grant date | Jun 18, 2013 |
| Priority date | — |
| Expiry date | Mar 4, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for preparing an organic film on a selected zone at the surface of a photosensitive semiconductor substrate, including (i) bringing a liquid solution which includes at least one organic adhesion primer into contact with at least the selected zone; (ii) polarizing the surface of the substrate to an electric potential more cathodic than the reduction potential of the organic adhesion primer; and (iii) exposing the selected zone to light radiation, the energy of which is at least equal to that of the band gap of the photosensitive semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.