Thermochemical nanolithography components, systems, and methods
US8468611B2 · kind B2 · utility
5Cited by
4References
20Claims
0Family size
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Key dates
| Filing date | Jun 1, 2010 |
| Grant date | Jun 18, 2013 |
| Priority date | — |
| Expiry date | Jun 16, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2049
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.