Patent · US Active

Thermochemical nanolithography components, systems, and methods

US8468611B2 · kind B2 · utility

5Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 1, 2010
Grant dateJun 18, 2013
Priority date
Expiry dateJun 16, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2049
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.